Radio frequency magnetron sputtering deposition of borate and phosphate glass films

There are different methods to obtain nanostructured thin films: chemical, physical, electrochemical, PLD and radio frequency deposition. The aim of this study was to establish the influence of the process parameters on the films structure and to improve the technological parameters. B 2 O 3 and P 2 O 5 vitreous targets have been obtained to be used as targets for r.f. magnetron sputtering. To obtain high quality targets it is necessary to use p.a. purity reagents which are dry mixed, then melt for 2 hours at 1200-1250°C. The melted mixture is poured in the mould. The vitreous materials are characterized by DTA, chemical analysis and x-ray diffraction to check for stoichiometry. The thin films obtained by r.f. magnetron sputtering have been characterized by AFM and SEM. The thickness of the composite films are "in situ" controlled in the range (2-20) nm. It seems that these films could be used as space layers in magnetoresistive superlattices, in spite these are totally amorphous without separations.