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Development of Dry-nano-polishing Technique using Reactive Ion Etching for Ultra Thin Titanium Wafer
Development of Dry-nano-polishing Technique using Reactive Ion Etching for Ultra Thin Titanium Wafer
2021
Teruya Chino
Yuta Watanabe
Yosuke Tsukiyama
Masayuki Sohgawa
Takashi Abe
Keywords:
Wafer
Reactive-ion etching
Titanium
Polishing
Nanotechnology
Materials science
Nano-
Correction
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