Old Web
English
Sign In
Acemap
>
Paper
>
Study on instantaneous heating during deposition of amorphous silicon by plasma CVD
Study on instantaneous heating during deposition of amorphous silicon by plasma CVD
2021
Taishi Nojima
Takuma Sato
Hiroaki Hanafusa
Seiitirou Higashi
Keywords:
Semiconductor
Plasma
Materials science
Deposition (chemistry)
Chemical engineering
Amorphous silicon
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]