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Application and further development of ion implantation for very large scale integration, part 2
Application and further development of ion implantation for very large scale integration, part 2
1982
K Haberger
H. J. Ryssel
K. Hoffmann
Keywords:
Ion implantation
Optoelectronics
Ion beam
Proximity effect (audio)
Very-large-scale integration
Bipolar junction transistor
Focused ion beam
Electron-beam lithography
Materials science
Integrated circuit
Atomic physics
Correction
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