Formation of high-T(c) superconducting films by organometallic chemical vapor deposition
1989
This invention relates to a method of forming high Tc superconducting films by organometallic chemical vapor deposition. More specifically, this invention relates to a method of forming superconducting films on a semiconductor surface by chemical vapor deposition of volatile organometallic compounds of the rare earth and alkaline earth elements, and copper.
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