Processing chamber cleaning method of a substrate processing apparatus, a substrate processing apparatus, and a substrate processing method
2005
Accommodating the substrate to be processed into the processing chamber, wherein Upon cleaning the processing chamber of a substrate processing apparatus to the substrate to be processed performs a predetermined process, forming a plasma of a gas containing oxygen into the processing chamber, the processing chamber and forming a plasma of the gas containing nitrogen is conducted alternately.
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI