Illumination optics for a metrology system for scanning an object with illumination light and EUV metrology system with an illumination optics

A metrology system (2) is designed to scan a field in an object (3) arranged object (5) with EUV illumination light (1). An illumination optical system (9) of the metrology system (2) has a arranged in the beam path directly to an EUV light source (6) collector mirror (B1). This is downstream of less than three further illumination mirror (B2, B3) in the beam path between the collector mirror (B1) and the object field (3). In the beam path between the collector mirror (B1) and the further illumination mirror (B2) an intermediate focus (11) is arranged. For metrology system (2) further widening part imaging optics (15) for imaging the object field (3) into an image field (13) in an image plane (14). The result is a metrology system with an illumination optics with an efficient illumination of the object field is assured with well-adapted to the current lighting situation EUV projection exposure systems lighting parameters.