PECVD silicon carbide surface micromachining technology and selected MEMS applications

Attractive material properties of plasma enhanced chemical vapour deposited (PECVD) silicon carbide (SiC) when combined with CMOS-compatible low thermal budget processing provides an ideal technology platform for developing various microelectromechanical systems (MEMS) devices and merging them with integrated circuits. In this paper we present a generic surface micromachining technology developed using a stress-optimised PECVD SiC as the structural and encapsulation material for MEMS. An overview of selected MEMS applications realised, at DIMES Technology Center (DTC) of TU Delft, using the PECVD SiC surface micromachining technology is provided. Presented MEMS examples include—a pressure sensor, wafer-level thin-film packaging, RF switch and accelerometers. Potential applications for the presented technology include automotive, industrial and medical systems, where devices are often subjected to harsh environments.