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Study of the Impact of H+ Mobile Ions on RF Performances of PECVD TEOS Silicon Dioxide Deposited at Low Temperature
Study of the Impact of H+ Mobile Ions on RF Performances of PECVD TEOS Silicon Dioxide Deposited at Low Temperature
2016
Anh Phuong Nguyen
U. Lüders
Frederic Voiron
Keywords:
Inorganic chemistry
Plasma-enhanced chemical vapor deposition
Ion
Silicon dioxide
Chemistry
Correction
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