LOCAL ANODIC OXIDATION OF NANOSTRUCTURES

Atomic force microscope is a device suitable for the creation of lithography using multiple kinds of techniques. AFM Anodic Oxidation Lithography is a kind of the AFM Voltage Lithography. With the use of the Voltage Lithography not only geometrical properties of the surface but also the local electro physical properties of the sample surface can be changed. Value of applied voltage influences results of voltage lithography as much as conductivity of the sample and surface quality. It turned out that the oxidation lithography (LAO) requires the voltage supply, as well as the sharpness of the tip and the ambient humidity. Local anodic oxidation lithography is a method that can change the surface of (semi)conductive sample in routine laboratory conditions. Increased humidity is the only requirement in the near vicinity of the sample. Mainly the tip sharpness but also many other parameters indicate the size of oxidation trace. Height and smooth of the track is inversely proportional to the speed. It turns out that set up of the system is less problematic than sample itself. In the case of silicon, easy oxidation prohibits the formation of intended oxide layer by local oxidation.