Parameterstudie an metallographischen Schliffproben mit der Ionenätzanlage RES 010

A systematic study of the parameters used for ion beam etching metallic materials was carried out in order to optimize the process. When etching the metallographically prepared specimens the extent of the etched area and the intensity by which the sample is attacked depend on voltage, current, and time set as well as on the material to be etched. The three parameters were varied for different groups of materials like steels, copper and a copper alloy, an aluminium alloy and titanium. The results reveal a correlation between the trial conditions and the etched microstructure of the materials documented by optical light microscope photographs.