Investigation of the conduction in an implanted layer of protons in a potassium lithium tantalate niobate substrate

The electrical conductivity in the amorphous layer formed by the implantation of protons at 1.15 MeV with fluence of 1.1×1017 ions/cm2 within the depth of potassium lithium tantalate niobate is investigated by four probes and Hall effect measurements. It is shown that the conductivity originates from electrons that are induced by “Hydrogen donors” that reside in a band structure 0.22 eV below the conduction band. It is claimed that this phenomenon enables the construction of conductive structures with submicron features within the depth of the substrate that can be used as embedded electrodes in electrooptical devices integrated in this substrate.