Elaboration and characterization of Fe/silica-nanofilm tailored surfaces

Abstract PECVD method with subsequent photolithography process has been used to create different tailored surfaces of Fe/silica with silicon oxide representative to that formed during recrystallization annealing of Si alloyed steels, i.e. stoichiometric, amorphous and about 50 nm in thickness. The tailored surfaces have been characterized by different analytical techniques like XPS, AES, Raman, FIB-TEM, AFM and mechanical profilometry.