Study of an Industrial Fabrication Process of Monocrystalline Silicon Solar Cells Based on Ion Implantation and Screen Printed Contacts

Large area solar cells square cut (10×10)cm2, can be obtained by a technology which combines ion implantation and furnace annealing, to obtain the emitter on a silicon single crystal texturized surface, and screen printing to form front grid and back contacts. Thickness of the implanted layer, as well as doping concentration both in the emitter and in the base, have shown to be critical parameters for optimization. This process, which is feasible of high automation on an industrial scale, should allow considerable reduction in production costs.