Synthesis and doping of TiO2 thin films via a new type of laser plasma source

Abstract The paper reports the characterization of doped TiO2 films produced by a modified laser plasma source. The peculiarity of the utilized apparatus was that both synthesis and doping were carried out in the same process, via Pulsed Laser deposition (PLD) in vacuum (growth) and by means of low-energy ion implantation or PLD in background gas (doping).