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Economical shallow emitter formation by plasma immersion ion implantation and RTA processes
Economical shallow emitter formation by plasma immersion ion implantation and RTA processes
1998
I Pintér
Cs. Ducso
N.Q. Khánh
M. Ádám
Zs Makaró
I. Bársony
Siva Sivoththaman
J. Poortmans
Guy Adriaenssens
Keywords:
Radiochemistry
Plasma-immersion ion implantation
Common emitter
Materials science
Optoelectronics
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