Experimental verification of high-NA imaging simulations using SHARP

The next-generation high-NA EUV scanner is being developed to enable patterning beyond the 3-nm technology node. Design and development of the scanner are based on rigorous litho-simulations. It is important to verify key imaging simulation findings by means of aerial image experiments with representative high-NA scanner characteristics. The first ASML-SHARP joint experiment was done with lines and spaces with pitches down to 16 nm wafer scale (1x). The experimental results confirmed the key litho-simulation findings: obscuration’s impact on high-NA imaging and mitigations of obscuration’s impact using flex illuminations.