Deposition of MgO films by ICP assisted evaporation

Crystalline MgO films could be prepared by ICP assisted evaporation without extra substrate heating. Mg was sublimated from a resistively heated Mo boat, while oxygen was introduced into the chamber with Ar during the deposition process. With increasing r.f.-power the structure and properties of the MgO films such as the crystallinity, the transmittance, the Mg/O ratio and surface uniformity were improved. The deposition pressure only changed the preferred orientation of MgO from (111) and (222) to (200). With the high growth rate of 800 A/min, the ICP assisted evaporation is thought to be a promising technique for MgO production in the PDP industry.