Model-based OPC using the MEEF matrix II

In the traditional OPC (Optical Proximity Correction) procedure, edges in a layout are broken into fragments and each fragment is iteratively adjusted by multiplying its EPE (Edge Placement Error) with a carefully selected or calculated feedback. However, the ever-shrinking technology nodes in recent years bring stronger fragment to fragment interaction. The feedback tuning approach driven by a single fragment EPE is no longer sufficient to achieve good pattern fidelity with reasonable turn-around-time. Various novel techniques such as matrix OPC [1, 2] have been developed in the past to incorporate the influence of neighboring fragments into each fragment’s movement. Here we introduce a neighboraware feedback controller for full chip level OPC applications, following the concept and algorithms of the matrix OPC that were laid out in Cobb and Granik’s work [1]. We present experimental results and discuss the benefits and challenges of the proposed feedback controller.