Illumination optics and imaging optics for a metrology system for scanning an object with EUV light as well as illumination and imaging metrology system with an illumination optics or of such imaging optics

A metrology system (2) is used for examining an object (5) with EUV illumination and imaging light (1). An illumination optics (7) for the metrology system (2) arranged one in the beam path in front of the object (5) illumination aperture stop (11) for edge-side limit of a bundle of the illumination light (1). The illumination aperture diaphragm (11) in a diaphragm plane (xy) has two mutually different by at least 10% aperture diameter in two mutually perpendicular directions. An imaging optical system (13) arranged in a beam path for the object (5) imaging the aperture stop (15) for edge-side limit of a bundle of the imaging light (1). The imaging aperture diaphragm (15) in a diaphragm plane (xy) in two mutually perpendicular directions, two differing from each other by at least 10% aperture diameter (Bx, By). This results in a metrology system, the optics are adapted to the present at the anamorphic projection exposure for the manufacture of semiconductor devices, illumination and imaging conditions.