SEMATECH's cycles of learning test for EUV photoresist and its applications for process improvement

With current progress in exposure source power, novel resist materials, and post processing techniques, EUV is getting closer to the production environment. As reported continuously, SEMATECH established cycles of learning program. The data generated from the program has been utilized to measure current state of the art of EUV photoresist for production or pilot line use. Thanks to SEMATECH core and associate members’ attention to the project, numerous EUV samples have been tested and they were based on the best performing EUV resists from associate members. This year we completed the evaluations for under-layers, lines and spaces, and contact holes. We also applied track based techniques to drive both low line edge roughness control and enlarge the process window with techniques such as FIRM TM and track based smoothing process. In this paper we will discuss about the results from cycles of learning test and show post-processing results of the three best line and space resists when combined with different FIRM TM materials.