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Quantum Chemical Investigation for Chemical Dry Etching of SiO₂ by Flowing NF₃ into H₂ Downflow Plasma
Quantum Chemical Investigation for Chemical Dry Etching of SiO₂ by Flowing NF₃ into H₂ Downflow Plasma
2012
Toshio Hayashi
Kenji Ishikawa
Makoto Sekine
Masaru Hori
Akihiro Kono
Koukou Suu
Keywords:
Plasma
Dry etching
Analytical chemistry
Chemistry
Quantum
Correction
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