Microelements with High Aspect Ratio Prepared by Self-Focusing of Light at UV-Curing

The results of deep lithography based on the long-wavelength UV photopolymerization with a light self-focusing effect are presented. The effect of the formation of “bridges” between the nearest photopolymerization areas is revealed. Its sources such as the inhibition of photopolymerization by oxygen due to its diffusion to the exposed area are discussed. The conditions for a high aspect ratio of microelements (up to 100) are determined.