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Plasma Jet Etching at Atmospheric Pressure for Semiconductor Production
Plasma Jet Etching at Atmospheric Pressure for Semiconductor Production
1996
O. Siniaguine
Keywords:
Reactive-ion etching
Plasma etcher
Capacitively coupled plasma
Plasma processing
Plasma cleaning
Semiconductor
Analytical chemistry
Argon
Plasma
Atomic physics
Materials science
Atmospheric pressure
Etching
Correction
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