Vacuum deposition equipment

PROBLEM TO BE SOLVED: To control a film thickness and a composition of a vapor deposition film in a vapor deposition film formed by a vacuum vapor deposition apparatus, it is necessary to more appropriately control the amount of vapor deposition material to be supplied and the amount of reaction gas. In a vacuum vapor deposition apparatus, a vapor deposition film is formed on a metal substrate 3 and simultaneously, a vapor deposition film is formed on a first transparent film substrate 6 and a second transparent film substrate 9. The resistance value and the transmittance of the first transparent film substrate 6 and the second transparent film substrate 9 are measured, and the evaporation amount of the deposition raw material 22 and the oxygen gas amount supplied from the first oxygen nozzle 18 and the second oxygen nozzle 19 are determined. Control. [Selection] Figure 2