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Very Low Temperature (Cyclic) Deposition / Etch of In-Situ Raised Sources and Drains
Very Low Temperature (Cyclic) Deposition / Etch of In-Situ Raised Sources and Drains
2014
Jean-Michel Hartmann
V. Benevent
Agathe André
Chutchamon Sirisopanaporn
M. Veillerot
Marie-Pierre Samson
Sylvain Barraud
Keywords:
In situ
Telecommunications
Metallurgy
History
Deposition (law)
Cartography
Materials science
Correction
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