Evaluating electrostatic damage prevention methods for full-scale reticle manufacturing

Discovery of Electric Field Induced Migration (EFM) below the control limits of Electrostatic Discharge (ESD) prevention has raised concerns in photomask manufacturing. We evaluated the control system by focusing on handling and processing. Using an in-situ monitoring device in combination with an ESD test reticle, we evaluated what infrastructure was necessary to accommodate new electrostatic concerns.