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W and Copper Interconnection Stability for 3D VLSI CoolCube Integration
W and Copper Interconnection Stability for 3D VLSI CoolCube Integration
2015
C. Fenouillet Beranger
S. Kerdiles
F. Deprat
P. Batude
M.-P. Samson
B. Previtali
N. Rambal
V. Lapras
L. Emery
C. Euvrard-Colnat
A. Seignard
P. Besson
R. Kachtouli
A. Roman
C. Ribiere
V. Lu
L. Brunet
E. Gourvest
G. Druais
Y. Loquet
L. Arnaud
Y. Le Friec
Olivier Pollet
V. Benevent
F. Aussenac
H. Denis
V. Jousseaume
S. Maitrejean
M. Vinet
Keywords:
Copper
Very-large-scale integration
Electronic engineering
Computer science
Interconnection
Electrical engineering
Correction
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