Photoetching machine projection lens wave aberration on-line measuring device and method

The invention discloses a photoetching machine projection lens wave aberration on-line measuring device and method, wherein the device comprises a light source, a projection lens, a detector, a working table and a mask plate, wherein the mask plate comprises a multi-illumination mode template and a test mark; the test mark is imaged by laser by means of the projection lens; the detector is provided with a reference mark and a photoelectric sensor below the reference mark; the laser enabling the test mark to be imaged is radiated on the photoelectric sensor after passing through the reference mark; the working table supports the detector, can move horizontally or vertically, can determine the position of the test mark image according to the intensity of electric signals output by the photoelectric sensor, and can obtain the wave aberration of the projection lens on line according to a matrix representing the projection lens aberration and the position displacement quantity relationship. According to the invention, the position displacement quantity can be measured under the multi-illumination mode through primary illumination and primary measurement, and the projection lens wave aberration detection speed is improved obviously.