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High-rate deposition of hydrogenated amorphous silicon by the VHF-GD method
High-rate deposition of hydrogenated amorphous silicon by the VHF-GD method
1987
H. Curtins
M. Favre
N. Wyrsch
M. Brechet
K. Prasad
Arvind Shah
Keywords:
Amorphous silicon
Glow discharge
Optoelectronics
Analytical chemistry
Thin film
Nanocrystalline silicon
Solar cell
Schottky diode
Physics
Radio frequency
high rate
Deposition (law)
Correction
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