Stencil mask manufacturing method

PROBLEM TO BE SOLVED: To provide a manufacturing method of a stencil mask which reduces flexure of a membrane resulting from ion beam heat generation, and has excellent heat resistance, durability, and ion implantation accuracy, in an ion implantation process. SOLUTION: In the stencil mask manufacturing method, a plurality of thin films are laminated, and patterning is performed by etching processing for each of the thin films. According to constitution of the method, the patterning is performed for every thin film of plural quantities, by which the thin films can be thickened irrespective of a ratio of a width to a depth (an aspect ratio) of a final throughhole pattern. COPYRIGHT: (C)2009,JPO&INPIT