Cryogenic GaAs Integrated Circuits Using a Lightly Doped GaAs FET Structure

1986 
Several papers in recent years about GaAs MESFETs with low doping levels have shown that lowering the operating temperature of this device (to around 100K) [1,2], can improve the carrier transport properties inside the active layer. One observes a rise of electron mobility and saturation velocity which leads to an increase of transconductance and saturation drain-source current. Cooling GaAs integrated circuits provides a means of raising the charge/discharge current inside the parasitic capacitances; thus it may be possible to combine either the high switching speed of conventional MESFETs with a low power dissipation or a higher logic gate speed capability with no increase of consumption. This work presents the performance of cooled high speed logic gates, based on a special MESFET structure, designed for low temperature operation.
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