Actinic tools for EUV resist characterization in research and production

Most of the cutting edge EUV photoresist research and development is currently being performed at RD beamlines or pre-production scanners. However, during EUVL introduction into mass production, more economic stand-alone solutions at the suppliers are needed. Within the portfolio of actinic EUV tools we offer a variety of solutions for resist characterization (sensitivity, contrast, resolution, absorbance, degradation and stability). Together with our research partners we have building blocks for actinic EUV solutions operating at a wavelength of 13.5 nm. Our expertise is the realization of customized solutions for the industry ranging from proof of principle experiments/setups to full functional industrial tools for the quality assessment in production.