Coating system and methods for coating, and coated articles

In CVD processes, PECVD and comprising PICVD process, the contaminant-free, precisely as possible in time and quantity supply of process gases for the desired coating systems will be improved by the invention. For this purpose, the invention provides a coating system and a method for coating objects with alternating layers provides be in which introduced into a gas mixing point alternately process gases and mixed with another gas and fed to the reaction chamber in which the deposition is carried out by generating a plasma.