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Controlled Etching of III-V Materials with Optical Emission Interferometry (OEI)
Controlled Etching of III-V Materials with Optical Emission Interferometry (OEI)
2011
Christopher Johnson
Dave Johnson
Russ Westerman
Dwarakanath Geerpuram
Linnell Martinez
Jason Plumhoff
Keywords:
Etching
Interferometry
Analytical chemistry
Optics
Materials science
optical emission spectroscopy
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