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Acemap > Paper > The Characteristics of Growth of Films of Zirconium and Hafnium Oxides (ZrO2, HfO2) by Thermal Decomposition of Zirconium and Hafnium β‐Diketonate Complexes in the Presence and Absence of Oxygen

The Characteristics of Growth of Films of Zirconium and Hafnium Oxides (ZrO2, HfO2) by Thermal Decomposition of Zirconium and Hafnium β‐Diketonate Complexes in the Presence and Absence of Oxygen

1979 
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