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(Invited) HfO2/Al2O3 Nanolaminate on Si0.7Ge0.3(100) Surface by Thermal Atomic Layer Deposition
(Invited) HfO2/Al2O3 Nanolaminate on Si0.7Ge0.3(100) Surface by Thermal Atomic Layer Deposition
2018
Iljo Kwak
Kasra Sardashti
Maximilian S. Clemons
Scott T. Ueda
Bernd Fruhberger
S. Oktyabrsky
Andrew C. Kummel
Keywords:
Thermal
Atomic layer deposition
Molecular physics
Materials science
Composite material
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