Sub-wavelength diffractive optics
1998
This report represents the completion of a three-year Laboratory-Directed Research and Development (LDRD) program to investigate sub-wavelength surface relief structures fabricated by direct-write e-beam technology as unique and very high-efficiency optical elements. A semiconductor layer with sub-wavelength sized etched openings or features can be considered as a layer with an effective index of refraction determined by the fraction of the surface filled with semiconductor relative to the fraction filled with air or other material. Such as a layer can be used to implement planar gradient-index lenses on a surface. Additionally, the nanometer-scale surface structures have diffractive properties that allow the direct manipulation of polarization and altering of the reflective properties of surfaces. With this technology a single direct-write mask and etch can be used to integrate a wide variety of optical functions into a device surface with high efficiencies; allowing for example, direct integration of polarizing optics into the surface with high efficiencies; allowing for example, direct integration of polarizing optics into the surfaces of devices, forming anti-reflection surfaces or fabricating high-efficiency, high-numerical aperture lenses, including integration inside vertical semiconductor laser cavities.
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