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SPECTROSCOPIC STUDY OF RF MAGNETRON SPUTTERING PLASMA FOR DEPOSITION TI6AL4V THIN FILM
SPECTROSCOPIC STUDY OF RF MAGNETRON SPUTTERING PLASMA FOR DEPOSITION TI6AL4V THIN FILM
2021
Dawood S. Ali
Omar M. Dawood
Keywords:
Optoelectronics
Thin film
Plasma
Deposition (chemistry)
Titanium alloy
Materials science
Sputter deposition
Correction
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