Old Web
English
Sign In
Acemap
>
Paper
>
Silicon Films Deposited by Low-Pressure Chemical Vapour Deposition for Microsystems
Silicon Films Deposited by Low-Pressure Chemical Vapour Deposition for Microsystems
2003
H. Mahfoz-Kotb
Anne-Claire Salaün
Tayeb Mohammed-Brahim
F. Bendriaa
Olivier Bonnaud
Keywords:
Electrostatic spray-assisted vapour deposition
Polycrystalline silicon
Metalorganic vapour phase epitaxy
Chemical vapor deposition
Combustion chemical vapor deposition
Metallurgy
Thin-film transistor
Materials science
Atomic layer deposition
Silicon
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
1
Citations
NaN
KQI
[]