Chemical polishing solution for metallographic sample and using method thereof

The invention discloses a chemical polishing solution for a metallographic sample and a using method thereof, and belongs to the technical field of metallographic inspection. The chemical polishing solution for the metallographic sample comprises a solution formed by mixing the following components according to proportional parameters: 43 to 53 percent of acetic acid, 28 to 37 percent of nitric acid and 15 to 25 percent of water; the metallographic sample is ground in a ventilating environment, then is placed in the heated polishing solution to be soaked for 10 to 20 seconds, and afterwards, is washed by using clear water and blow-dried, and then the sample is placed below a metallographic microscope to be observed. The chemical polishing solution for the metallographic sample and the using method thereof have the advantages of being simple, feasible, practical and reliable, and the metallographic inspection efficiency and quality of such alloys are greatly improved.