New Developments in Micromegas Microbulk Detectors

Abstract A new Micromegas manufacturing technique, based on kapton etching technology, has been recently developed, improving the uniformity and stability of this kind of detectors. Excellent energy resolutions have been obtained, reaching 11% FWHM for the 5.9 keV photon peak of 55 Fe source and 1.8% FWHM for the 5.5 MeV alpha peak of the 241 Am source. The new detector has other advantages like its flexible structure, low material and high radio-purity. The two actual approaches of this technique will be described and the features of these detectors in argon-isobutane mixtures will be presented. Moreover, the low material present in the amplification gap makes these detectors approximate the Rose and Korff model for the avalanche amplification, which will be discussed for the same type of mixtures. Finally, we will present several applications of the microbulk technique.