Scatterless SiO 2 /TiO 2 multi-layered thick UV-IR cut filter prepared by EPD system
2016
Scatterless SiO2/TiO2 multi-layered thick UV-IR cut filter can be prepared by the new IAD method called EPD (Effective Physical vapor Deposition).
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI