The synthesis, characterization and lithographic behavior of acid photogenerating systems based upon 2-nitrobenzyl ester derivatives.

Methodology was developed for the synthesis of novel 2- substituted o-nitrobenzyl chromophores which were derivatized as the tosylate esters. The thermal stabilities of these new tosylates fell within the range predicted from an empirical model. Lithographic sensitivities of deep UV resists made from these new esters and poly(4-(tert-butoxycarbonyloxy)styrene-sulfone) ranged from 45mJ/cm2 to 90 mJ/cm2.