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Low‐k Spacers for 22 nm FDSOI Technology
Low‐k Spacers for 22 nm FDSOI Technology
2017
Fabian Koehler
Bianca Antonioli
Dina H. Triyoso
Han Tao
Klaus Hempel
Keywords:
Condensed matter physics
High-κ dielectric
Atomic layer deposition
Optoelectronics
Chemistry
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