An approach for the fabrication of hexagonally ordered arrays of cylindrical nanoholes in crystalline and amorphous silicon based on the self-organization of polymer micelles

A nanolithographic process is introduced based on the self-organization of gold salt loaded inverse micelles formed by poly(styrene)-block-poly(2-vinylpyridine) di-block-copolymers in toluene. The developed procedure allows the fabrication of hexagonally arranged cylindrical nanoholes (diameters ≥20 nm, aspect ratios ~7) in crystalline as well as in amorphous Si. In the latter case, applying the concept to amorphous Si layers evaporated onto any substrate results in nanomasks allowing the transfer of the hole pattern into the substrate.