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Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures
Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures
2016
Matthias Minjauw
Jolien Dendooven
Boris Capon
Christian Dussarat
Eduardo Solano Minuesa
Kilian Devloo-Casier
Jakob Kuhs
Marc Schaekers
Alessandro Coati
Christophe Detavernier
Keywords:
Thermal
Surface finish
Atomic layer deposition
Composite material
Materials science
Plasma
Correction
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