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MOSFET with La2HfO7 and HfO2 high-k dielectrics integrated in a conventional flow
MOSFET with La2HfO7 and HfO2 high-k dielectrics integrated in a conventional flow
2005
Luigi Pantisano
Thierry Conard
Martine Claes
Marc Demand
W. Deweerd
Stefan De Gendt
Marc Heyns
Michel Houssa
Marc Aoulaiche
Guilherme Lujan
Lars-Ake Ragnarsson
E. Rohr
Tom Schram
Jacob Hooker
Chris Rittersma
Jean Fompereyne
Jean-Pierre Locquet
A. Dimoulas
Keywords:
High-κ dielectric
Dielectric
MOSFET
Electronic engineering
Materials science
Optoelectronics
Flow (psychology)
Correction
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