Apparatus of Monitoring a Process Using Poarized Light and Method Thereof

Described herein is an apparatus for manufacturing a semiconductor which comprises a chamber having a susceptor for attaching a processed product on the lower inner portion and a polarization spectral reflection module located in the upper portion of the chamber. The polarization spectral reflection module comprises: a light source for generating light; a beam splitter for receiving the light generated from the light source to reflect a portion; an objective polarizer for polarizing the light reflected by the beam splitter to irradiate a processed product on the susceptor; a reflective aperture in which the reflected polarized light reflected from the processed product counter-passes the object polarizer, a portion of the reflected polarized light passes through the beam splitter, and a portion of the reflected polarized light passed through the beam splitter passes through the reflective aperture; a blaze grating for reflecting the reflected polarized light passed through the reflective aperture; and an array director for sensing the reflected polarized light separated and reflected by the blaze grating.