Kinetics of CxNy formation on electrode surface using the electrochemical method

Powded CxNy coatings were deposited from acetonitrile on Ni, Si, and C surfaces at a voltage 500-2000 V by the electrochemical method. Electrolysis products were analyzed by IR spectroscopy, X-ray phase analysis and electron microscopy. According to FTIR data, at frequencies 1370 and 1530 cm -1 , absorption bands characteristic for stretching C-N and C=N oscillations are observed. The obtained results indicate that the deposition process occurs in a different manner in each specific case, i.e., the kinetics of the electrode depends on the electrode material (Ni, Si, and C).